论文部分内容阅读
1992年美国贝尔实验室的E.Betzig等人成功地将近场光学显微术用于磁光薄膜材料磁畴的成像和记录,得到尺寸为60nm记录磁畴,约45 Gbits/inch~2的超高记录密度。至今近场光学记录技术的实用化及商业化一直是许多人追求与努力的目标。近几年来的一些主要发展,除了各式近场光学探针读写的技术、固体浸没镜头(Solidimmersion lens,SIL)的近场光驱之外,便是由日本通产省工业技术研究院,产业技术融合研究所的富永淳二(J.Tominaga)博士,于1998年所发表的超分辨掩膜结构光盘。此种技术可以用一般光驱的读写头,在记录层上写
In 1992, E.Betzig et al. Of Bell Labs in the United States successfully used near-field optical microscopy for the imaging and recording of magnetic domains of magneto-optical thin film materials, resulting in a recording domain with a size of 60 nm and an ultra-small size of about 45 Gbits / inch ~ 2 High recording density. So far, the practical application and commercialization of near field optical recording technology has been the goal of many people’s pursuit and hard work. In addition to various near-field optical probe reading and writing technologies and near-field optical drives for Solid Immersion lens (SIL), some of the major developments in recent years have been carried out by Japan’s MIIT, Industrial Technology Research Institute, J. Tominaga, Ph.D., Institute of Technology Convergence, a super-resolution mask structured disc published in 1998. This technology can use the general optical drive read and write head, write in the recording layer