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本文介绍用气相色谱法测定非晶硅薄膜中氢的总含量及不同温度下氢的释放率,这种方法比过去在氢的热释放实验中采用的气压测定法更可靠.
This article describes the determination of the total hydrogen content in amorphous silicon thin films by gas chromatography and the hydrogen release rate at different temperatures. This method is more reliable than the atmospheric pressure measurement used in the hydrogen heat release experiments.