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形状记忆合金薄膜以其功密度高、输出力和位移大成为微型机电系统领域最有潜力的微驱动材料之一。研究了丝材冷轧和溅射薄膜工艺 ,获得了理想的 Ti Ni薄膜 ,对于溅射工艺 ,给出了增加溅射薄膜中 Ti含量的一种新途径 ,并应用原子力显微镜对薄膜进行了微观形貌分析。
Shape memory alloy thin-film with its high power density, output force and displacement of the micro-electromechanical systems become the most promising micro-drive material. The technology of cold rolling and sputtering thin films was studied, and the ideal Ti Ni thin film was obtained. A new way to increase the Ti content in the sputtered thin films was given for the sputtering process. The microstructure of the films was observed by atomic force microscopy Morphological analysis.