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针对模拟冷却水中各种离子对黄铜管的耐蚀性影响采用光电化学方法和交流阻抗法进行了研究。在模拟水中黄铜电极表面膜显示p-型光响应,光响应来自电极表面的Cu2O层,改变模拟水溶液中Cl-、SO42-和S2-浓度时,其表面膜的半导体性质仍为p-型,但阴极光电流峰值的大小会发生变化,阴极光电流峰值越大,其耐蚀性能越好。随着Cl-、SO42-和S2-浓度的增加,黄铜的阻抗逐渐增大,耐蚀性能提高,当Cl-、SO24-和S2-浓度分别高于49.92 mg/L、80.8 mg/L、10 mg/L时,黄铜耐蚀性能降低,腐蚀越严重。
Aiming at the effect of various ions on the corrosion resistance of brass tube in simulated cooling water, the photoelectrochemical method and AC impedance method were used. The p-type photoresponse appears on the surface of the brass electrode in simulated water and the photoresponse comes from the Cu2O layer on the surface of the electrode. The semiconducting properties of the surface film are still p-type when the concentrations of Cl-, SO42- and S2- in the simulated aqueous solution are changed , But the peak value of cathode photocurrent will change. The larger the peak value of cathodic photocurrent, the better its corrosion resistance. With the increase of Cl-, SO42- and S2-, the impedance of brass increases gradually and the corrosion resistance increases. When the concentrations of Cl-, SO24- and S2- are higher than 49.92 mg / L and 80.8 mg / L respectively, 10 mg / L, brass corrosion resistance decreases, the more serious corrosion.