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在现代大型薄膜连续生产线中 ,其生产效率主要受以下两因数的影响 :溅射器的沉积速率和靶材的使用周期。本实验研制了一种圆筒形靶材绕溅射器中心轴线匀速旋转 ,并且与溅射器之间用螺丝固定连接的新型磁控溅射器。论述了新型溅射器的结构与组成 ,并给出实验结果与结论。其具有靶材利用率高、使用周期长、换靶时间短等优点。同时在反应溅射时避免在靶面上的形成介质层 ,提高了溅射过程的稳定性。
In the modern large-scale continuous film production line, its production efficiency is mainly affected by the following two factors: the deposition rate of the sputter and the target life cycle. In this experiment, we developed a new type of magnetron sputtering device with cylindrical target rotating at a constant speed around the central axis of the sputter and screw-connecting with the sputter. The structure and composition of a new type of sputter were discussed, and the experimental results and conclusions were given. The utility model has the advantages of high utilization ratio of the target material, long service life and short target changing time. At the same time in the reactive sputtering to avoid the formation of the dielectric layer on the target surface to improve the stability of the sputtering process.