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本文用背散射和中子活化分析技术测量了砷注入硅中绝对剂量值.对四种类型注入机的剂量作了分析.由测试结果发现注入机的标称剂量值与保留剂量值有较大差别,文章分析了其原因,并提出了用注入样品退火后的电阻来校准和监测注入机剂量的方法.
In this paper, the backscattering and neutron activation analysis techniques were used to measure the absolute dose of arsenic implanted into silicon.The dose of four types of implanters was analyzed.The test results showed that the nominal dose and implanted dose of implanter were larger The paper analyzes the causes and proposes a method of calibrating and monitoring the dose of the implanter with the resistance of the annealed sample after injection.