论文部分内容阅读
为了控制高损伤阈值高反射镜膜层的应力,研究了沉积过程中沉积倾角、充氧量对高、低折射率单层膜应力大小的影响。研究发现这两个参数对控制薄膜应力有很大影响,SiO2薄膜在沉积倾角较小和充氧量增大时应力都逐渐减小,SiO2薄膜应力为压应力;HfO2薄膜在充氧量增大时薄膜应力变小,HfO2薄膜应力为张应力。因此,根据SiO2和HfO2薄膜的应力特性,调整镀膜工艺,实现了高、低折射率膜层之间的应力匹配,控制了反射镜面形;同时,镀制的高反射镜满足高功率激光器损伤阈值的要求。
In order to control the stress of high damage threshold high mirror layer, the influence of sedimentation dip and oxygenation on the stress of high and low refractive index monolayers was studied. It is found that these two parameters have a great influence on the stress of the control film. The stress decreases gradually when the deposition angle is small and the oxygen content is increased, and the stress of the SiO2 film is compressive stress. The oxygen permeability of the HfO2 film increases When the film stress becomes smaller, HfO2 film stress is tensile stress. Therefore, according to the stress characteristics of SiO2 and HfO2 thin films, the coating process is adjusted to realize the stress matching between high and low refractive index layers and control the mirror surface shape. Meanwhile, the plated high reflection mirror meets the damage threshold of high power laser Request.