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对经典的DLA模型进行改进 ,研究了薄膜的二维生长过程 .通过改变表征吸附原子在基底扩散能力的参量DT,DC 以及表征沉积速率的参量DV ,得到了与实验一致的薄膜分形生长模式和团状生长模式 .分析了薄膜的形核阶段原子团的大小分布 ,以及不同条件下原子团的数目和大小随覆盖度的变化 .
The classical DLA model is modified to study the two-dimensional growth process of the thin film. By changing the parameters DT and DC that characterize the diffusion of adsorbed atoms on the substrate and the parameter DV that characterizes the deposition rate, The growth pattern of clumps was analyzed.The size distribution of atomic groups in the nucleation stage and the variation of the number and size of atomic groups with the coverage under different conditions were analyzed.