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用脉冲激光沉积方法,以多靶交替溅射方式,在SiO2/Si基底上沉积镱铒共掺Al2O3光学薄膜,讨论了脉冲激光能量对薄膜沉积速率、表面形貌、光致发光强度的影响。在脉冲激光能量较高条件下制备出的薄膜的光致发光性能较好,脉冲激光能量较低条件下制备出的薄膜的表面形貌较均匀。综合放大器增益系数对光致发光强度和光刻工艺对薄膜表面形貌的要求,薄膜应该在合适的激光能量下制备。脉冲激光溅射沉积方法与中频磁控溅射方法相比,在抑制上转换发光方面具有优越性。
The pulsed laser deposition method was used to deposit Yb-erbium codoped Al2O3 optical films on SiO2 / Si substrates by multi-target alternating sputtering. The effects of pulse laser energy on the deposition rate, surface morphology and photoluminescence intensity of the films were discussed. The films prepared under higher pulsed laser energy have better photoluminescence properties and the films prepared under lower pulsed laser energy have more uniform surface morphology. According to the requirement of photoluminescence intensity and lithography process on the film surface topography, the film should be prepared with the appropriate laser energy. Compared with the medium frequency magnetron sputtering method, the pulsed laser sputtering deposition method has the superiority in suppressing upconversion luminescence.