介绍了LCoS技术的特点与发展现状,LCoS性能的优劣与硅基片平整度有直接关系,着重进行了LCoS微显示驱动技术表面形貌的研究与改进。通过严格控制工艺步骤,降低台阶高度;合理设计版图布局,使台阶叠加在隔离像素区域的沟槽中,这样既能实现像素电极区域的局部平坦化,又因为沟槽不作为显示区域,对整体显示效果影响较小。 The characteristics and development status of LCoS technology are introduced. The advantages and disadvantages of LCoS performance are directly related to the flatness of silicon substrate. The research and improvement on the surface morphology of LCoS microdisplay driving technology are emphasized. By strictly controlling the process steps, the height of the step is reduced. The layout of the layout is reasonably designed so that the steps are superimposed in the grooves of the isolated pixel region, so that the local planarization of the pixel electrode region can be achieved. Because the groove is not used as the display region, The effect of display is small.