HPCVD法在不同载流气体下MgB2薄膜的生长

来源 :第十三届全国超导学术研讨会 | 被引量 : 0次 | 上传用户:game780
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  目前,用于射频超导加速器的纯铌超导腔的制备技术趋于成熟,MgB2因其具有较高的超导转变温度和临界磁场等优势,成为理想的超导腔候选材料之一。本文利用混合物理化学气相沉积法(HPCVD)在氢气、氩气、氮气和氦气等不同载流气体下沉积铌衬底的MgB2薄膜。薄膜在36-39K之间均发生了超导转变,X射线衍射分析显示样品均有MgB2的(101)峰,扫描电镜观察到薄膜表面有明显的六方结构的MgB2多晶晶粒。对样品进行弯折实验发现,不同于氢气条件下制备的样品,氩气、氦气下制备的薄膜弯折后仍然保持良好的连接性。而在氩气和氮气条件下沉积的薄膜表面不干净,实验结果表明,氦气也可用于射频超导加速器的超导腔中MgB2薄膜的生长。
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