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文中叙述了在不同的氧气露点条件下获碍不同的实验结果。对实验结果从石英-石墨-水的反应中作了分析,并从六个化学反应方程式中可以看出:影响外延层纯度的主要剩余杂质是氧、硅、碳。再将其实验结果绘制在 N_D-N_A 关系曲线上,从该关系曲线和对杂质行为的分析中可以初步看出:(1)三组数据的载流子浓度随 H_2中含水量的增加而增加,而迁移率μ_n 则减小。(2)化学受主的浓度随 H_2中含水量的增加而增加,N_A 也随之增大。文中最后提出提高质量的几点看法。
The article describes the different oxygen dew point conditions hinder the different experimental results. The experimental results were analyzed from the quartz-graphite-water reaction. From the six chemical reaction equations, it can be seen that the main residual impurities that affect the purity of the epitaxial layer are oxygen, silicon and carbon. Then the experimental results are plotted on the curve of N_D-N_A. From the relationship curve and the analysis of the impurity behavior, it can be preliminarily shown that: (1) The carrier concentration of three sets of data increases with the increase of water content in H_2 , While the mobility μ_n decreases. (2) The concentration of chemical acceptor increased with the increase of water content in H 2, and N_A also increased. Finally, the article put forward some suggestions on improving the quality.