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采用循环伏安法和电位阶跃法对锡在铂电极上的欠电位沉积 (UPD)行为进行了研究 ,讨论了不同沉积时间锡在铂电极上的覆盖度与电位的关系以及锡的吸附沉积量及氧化溶解量与电位的关系 ,并用循环伏安法对锡原子层的溶出进行了测定 .
Cyclic voltammetry and potential step method were used to study the undeveloped deposition (UPD) behavior of tin on platinum electrode. The relationship between the tin coverage on the platinum electrode and the potential at different deposition time and the adsorption and deposition of tin The amount of dissolved oxygen and the relationship between potential and potential, and by cyclic voltammetry tin atomic layer dissolution was determined.