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用喷涂法制备的掺锑SnO_2膜,其方块电阻可达～15Ω/□,在可见光区的光透过率达85—92％。XPS和AES剖面分析表明:该膜的表面存在约15(?)的富氧区和约50(?)的富氯区,而其内部是均匀的SnO_2多晶结构。
Antimony-doped SnO 2 films prepared by spray coating have a sheet resistance of ~ 15Ω / □ and a light transmittance of 85-92% in the visible region. XPS and AES analyzes show that there are about 15 (?) Oxygen-rich regions and about 50 (?) Chlorine-rich regions on the surface of the film, while the SnO2 polycrystal structure is uniform inside.