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利用磁控溅射镀膜技术分别在硬质合金YG6X和单晶Si片表面制备TiN薄膜,分析N2流量对薄膜相组成、表面形貌、显微硬度和膜基结合力的影响。结果表明,N2流量对薄膜的微结构以及力学性能具有重要影响。随着N2流量的降低,TiN薄膜表面孔洞和台阶明显减少,表面平整度得到明显改善;薄膜的物相组成在N2流量为0.2sccm时为TiN和TiN0.61两相;N2流量的变化改变了薄膜表面的能量状态,因此,降低N2流量导致TiN薄膜的生长取向由(200)面向(111)面转变。同时,N2流量为2.4 sccm时TiN薄膜的膜基结合力最高,此时TiN薄膜也具有最高的显微硬度。
The effects of N2 flux on the phase composition, surface morphology, microhardness and film-substrate adhesion of the thin films were analyzed by magnetron sputtering coating technology on the surface of YG6X and Si wafer respectively. The results show that N2 flow has an important influence on the microstructure and mechanical properties of the films. With the decrease of N2 flow rate, the surface pores and steps of TiN films decrease obviously, and the surface flatness is obviously improved. The phase composition of films is TiN and TiN0.61 when the flow rate of N2 is 0.2sccm. The change of N2 flow rate changes Therefore, reducing the flow rate of N2 causes the growth orientation of the TiN film to change from (200) to (111) planes. At the same time, TiN film has the highest film-based adhesion when N2 flow rate is 2.4 sccm, and the TiN film also has the highest microhardness.