四磺酸酞菁钴-DDAB表面活性剂薄膜电极的电化学与电化学催化研究

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四磺酸酞菁钴配合物阴离子 ( Co Pc TS4- )在水溶液中可借助离子交换进入阳离子表面活性剂双十二烷基二甲基溴化铵 ( DDAB)薄膜 ,从而形成 Co Pc TS4- DDAB薄膜电极 .循环伏安法表明 ,该薄膜电极在 p H7.0的空白缓冲溶液中十分稳定 ,有两对准可逆的还原氧化峰 ,其中第一对峰的 Epc1 =-0 .2 8V,Epa1 =-0 .1 8V( vs.SCE) ,为中心离子 Co( ) Co( )的还原氧化峰 ;第二对峰的 Epc2 =-1 .30 V,Epa2 =-1 .1 8V,为酞菁环的还原氧化峰 .应用循环伏安法估计了该薄膜体系的电荷传递扩散系数 Dct和表观非均相电极反应速率常数 ko .Co Pc TS4- DDAB薄膜电极可用于对三氯乙酸 ( TCA)的电化学催化还原 .催化电流与 TCA浓度在 4× 1 0 - 5~ 1× 1 0 - 3 mol L范围内成线性关系 . The cobalt phthalocyanine tetrasulfonate complex anion (Co Pc TS4-) can be ion exchanged into the cationic surfactant didodecyldimethylammonium bromide (DDAB) film in aqueous solution to form Co Pc TS4-DDAB The results of cyclic voltammetry showed that the thin film electrode was very stable in p H7.0 blank buffer with two reversible redox peaks. Epc1 = -0.282V and Epa1 = -0 .1 8V (vs.SCE), which is the reduction oxidation peak of the central ion Co () Co (); Epc2 = -1.30 V and Epa2 = -1. The reduction oxidation peak of the ring was determined by cyclic voltammetry.The charge transfer diffusion coefficient (Dct) and apparent heterogeneous electrode reaction rate constant (ko) were estimated by cyclic voltammetry.Co PC TS4-DDAB thin film electrode can be used for the determination of trichloroacetic acid (TCA) The catalytic current was linear with the concentration of TCA in the range of 4 × 10 ~ 5 ~ 1 × 10 3 mol L.
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