在半导体集成电路制造工艺中,照相制版工序是关键之一。目前,大规模集成电路的制作对精缩掩模版的要求已相当高,为满足照相制版的需要,对精缩镜头的要求也越来越高。大规模集成电路制版技术,大大地促进了高精度镜头的研制,电子计算机的广泛应用又为设计高质量镜头提供了可能。 In the semiconductor integrated circuit manufacturing process, the photolithography process is one of the keys. At present, the requirements for the manufacture of large scale integrated circuits for the reticle are quite high. In order to meet the needs of photolithography, the requirements for the retouch lens are also getting higher and higher. Large-scale integrated circuit platemaking technology, greatly promoted the development of high-precision lens, the extensive use of electronic computers and for the design of high-quality lens offers the possibility.