据日刊《东芝评论》1977年2月报导,日本东芝R和D中心发明了一种新型的大规模集成电路照相掩模缺陷检测装置。由于通常采用的用显微镜检测照相掩模图形缺陷的方法需要极大的工作量,所以一台能够节省检测时间的机器的出现已长期为人们所渴望。应用特殊的光学方法使缺陷呈红色,而掩模图形则呈绿色,这样就大大地帮助了操作人员, According to the journal “Toshiba Review” reported in February 1977, Japan R Toshiba R and D Center invented a new large-scale integrated circuit photographic mask defect detection device. Since the commonly used method of microscopically detecting photographic mask pattern defects requires a significant amount of work, the advent of a machine that can save inspection time has long been a thirst for people. Application of special optical methods make the defect red, while the mask is green graphics, thus greatly helping the operator,