提出了一种基于电子束曝光制备光滑曲面微结构的新技术。对聚合物玻璃转化温度与分子量之间的关系、分子量与电子束吸收能量密度之间的关系进行了理论分析,发现聚合物玻璃转化温度随吸收能量密度的增加而减小。以此为依据,在FEI820Dual Beam FIB/SEM系统上采用15keV、不同剂量的电子束对S1805正性抗蚀剂微结构进行了曝光实验,得到了具有不同高度、轮廓清晰的光滑曲面微结构,为使用电子束曝光技术加工光滑曲面微结构提供了新工艺。 A new technique based on electron beam exposure for the fabrication of smooth curved microstructures was proposed. The relationship between the conversion temperature and molecular weight of polymer glass and the relationship between molecular weight and electron beam energy density were theoretically analyzed. It was found that the transition temperature of polymer glass decreased with the increase of absorbed energy density. Based on this, the micro-structure of S1805 positive resist was exposed on the FEI820Dual Beam FIB / SEM system using 15 keV and different doses of electron beam. The microstructures of smooth surface with different heights and clear contours were obtained. The use of electron beam exposure technology to smooth surface microstructure provides a new process.