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本文用DTPA-NH_4~+作排代剂,分别以Zn~(2+)、H~+为阻滞离子,研究了高压离子交換螯合排代时稳定谱带的移速(V)问题.发现,V随排代剂中NH_4NO_3的加入而递增,但并不随排代离子NH_4~(2+)浓度(C_(NH_4~+)~0)的增加而正比地升高.由此提出了有效排代离子(此处为有效铵)浓度(C_(NH_4~+)~*)的概念,用模拟过程,推导出这一浓度的计算式:在很宽的铵浓度范围内保持为一常数.由此确定了螯合排代时稳定谱带的移动式为:实验证实上述公式的正确性.还发现,以H~+为阻滞离子,在排代离子浓度足够高的条件下,可以显著提高稳定谱带栘速,并对其机制作了讨论.以上述工作为基础,论述了离子交换螯合排代法谱带移速的规律.
In this paper, we use DTPA-NH_4 ~ + as displacing agent, and study Zn (2 +) and H ~ + as blocking ions respectively. It was found that V increased with the addition of NH_4NO_3 in the effluent, but did not increase proportionally with the increase of NH_4 ~ (2+) concentration (C_ (NH_4 ~ +) ~ 0) The concept of displacement ion (here, effective ammonium) concentration (C_ (NH_4 ~ +) ~ *) is derived from the simulation and the formula for this concentration is derived: it remains constant over a wide range of ammonium concentrations. From this, we can confirm that the moving band of the stable band during the chelation displacement is: The correctness of the above formula is verified by experiment, and it is also found that when H ~ + is the blocking ion, the displacement ion concentration can be significantly high To improve the stability of the speed of the band, and its mechanism is discussed.Based on the above work, discussed ion exchange chelation displacement law of the band shift.