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利用金属蒸发真空多弧离子源(MEVVA源)注入机,将Au离子注入到高纯石英玻璃衬底中来制备Au纳米颗粒,Au离子注入的加速电压分别为20、40和60 k V,注入剂量为1×1017ions/cm2,随后将注入样品在普通管式退火炉中700~1000℃退火处理。研究了注入条件和热退火参数对Au纳米颗粒的形成、生长、分布以及光学性能的影响。采用光学吸收谱、扫描电子显微镜和透射电子显微镜对注入样品的光学性能、表面形貌和微观结构进行了测试和表征。实验结果表明,采用该低压离子注入结合热退火工艺的方法,所制备的Au纳米颗粒具有很强的局域表面等离子体共振特性,同时该方法也为制备尺寸和分布可控的Au纳米颗粒提供了一些新的参考途径。
Au nanoparticles were prepared by injecting Au into a high purity quartz glass substrate by using a metal evaporation vacuum multi-arc ion source (MEVVA source) implanter. The accelerating voltages of Au ion implantation were 20, 40 and 60 kV, respectively The dose was 1 × 1017ions / cm2, and then the injected sample was annealed at 700 ~ 1000 ℃ in a conventional tube annealing furnace. The effects of implantation conditions and thermal annealing parameters on the formation, growth, distribution and optical properties of Au nanoparticles were investigated. The optical properties, surface morphology and microstructure of the implanted samples were tested and characterized by optical absorption spectroscopy, scanning electron microscopy and transmission electron microscopy. The experimental results show that Au nanoparticle prepared by the low-pressure ion implantation combined with thermal annealing process has strong local surface plasmon resonance characteristics, and the method also provides the preparation of Au nanoparticles with controlled size and distribution Some new reference ways.