β-C3N4是Cohen等人从理论上预言的一种可能比金刚石更硬的物质,含有β-C3N4的碳氮膜具有优异的电学、光学和机械特性,在很多领域有应用前景。人们已经应用多种方法进行碳氮膜的制备。本文将对等离子体技术在碳氮膜制备中的应用进行综述,并在成膜速率、成膜质量等方面,对以往工作成果进行论述;最后将讨论沉积过程中几个参量对碳氮膜沉积速率、膜结构等的影响。 β-C3N4 is a kind of material possibly predicted by Cohen et al. which may be harder than diamond. The β-C3N4-containing carbon-nitrogen film has excellent electrical, optical and mechanical properties and has applications in many fields. A variety of methods have been used to prepare carbon nitrogen films. This paper reviews the application of plasma technology in the preparation of carbon nitrogen film, and discusses the work in the past in the aspects of film formation rate, film quality and so on. Finally, we will discuss the deposition of several parameters on the deposition of carbon and nitrogen film Velocity, membrane structure and the like.