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利用自制高能等离子体辅助化学气相沉积设备在1Cr18Ni9Ti衬底上,在离子能量2keV、工作压力2Pa、工作气氛为CH4/H2=10%的工艺条件下得到了一种硬度高、导电性能良好、可能具有碳链结构的新型碳膜.工艺研究结果表明,衬底材料对制备该新型纳米碳膜具有关键作用,离子能量、工作压力及气氛等工艺因素也具有重要作用.原子力显微镜分析结果表明,该薄膜晶粒尺寸小于100nm,薄膜光滑、致密、均匀.拉曼光谱分析显示,该薄膜的拉曼光谱特征为中心峰在1580cm-1附近、显著宽化的单一峰.欧姆计测量表明该薄膜的薄膜电阻为1·6×104Ω/cm2.利用纳米力学探针测得该纳米碳膜的显微硬度为21·38GPa,体弹性模量为420·65GPa.
Using a homemade high-energy plasma-assisted chemical vapor deposition equipment 1Cr18Ni9Ti substrate at ion energy 2keV, working pressure 2Pa, the working atmosphere of CH4 / H2 = 10% under the conditions of a high hardness, good conductivity, may The results show that the substrate material plays a key role in the preparation of the novel carbon nanofilms, ion energy, working pressure and atmosphere and other process factors also have an important role.Analytical AFM results show that the Raman spectrum analysis showed that the Raman spectrum of the film was characterized by a single peak with a wide central peak around 1580cm-1, which was observed by ohmmeter measurement The sheet resistance was 1.6 × 104Ω / cm2.The microhardness of the nano-carbon film was 21.38GPa and the bulk modulus was 420.65GPa.