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用扫描电子显微镜、电子能谱仪、X射线衍射等研究了在Ar气氛中,经1150℃,10h等温热处理后,Si3N4/Fe,Si3N4/Fe3Al平面偶界面固相反应区的形貌、成分分布、显微结构及相组成。结果表明:Si3N4/Fe界面固相反应形成约120μm厚的反应区,Fe含量从Si3N4侧到Fe侧逐渐增加,反应区中的Si成分约为5%(原子分数),反应区主要由Fe(Si)固溶体构成,其中均匀地分布着细小的孔洞;Si3N4/Fe3Al界面固相反应形成约3μm厚的反应区,反应区具有比Fe3Al高得多的Al含量,反应区由FeAl,Fe(Al,Si)固溶体及三元化合物Al9FeSi3构成。Si3N4/Fe3Al具有比Si3N4/Fe高得多的界面化学相容性。
The morphologies of the solid-state reaction sites of Si3N4 / Fe and Si3N4 / Fe3Al planes at the interface of Ar3O4 and Fe3Al were investigated by scanning electron microscopy, Composition distribution, microstructure and phase composition. The results show that the Si3N4 / Fe interface forms a reaction zone about 120μm thick, and the content of Fe gradually increases from Si3N4 side to Fe side. The Si composition in the reaction zone is about 5% (atom fraction), and the reaction zone is mainly composed of Fe ( Si) solid solution. The Si3N4 / Fe3Al interface solid-state reaction formed about 3μm thick reaction zone, the reaction zone has a much higher content of Al than Fe3Al, the reaction zone consists of FeAl, Fe (Al, Si) solid solution and a ternary compound Al9FeSi3. Si3N4 / Fe3Al has a much higher interface chemical compatibility than Si3N4 / Fe.