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研究了SiC和SiC-WC在真空中的自对偶高温摩擦性能。随着温度的升高，SiC／SiC的摩擦系数变化不大，比磨损率(自对偶体积磨损量与接触压力和摩擦路程之比)从20℃到800℃保持为4.0×10~(-8) mm~3／(N·mm)(模式Ⅰ)，从800℃到1 200℃减少(模式Ⅱ)，自对偶的高温磨损机理由轻微的粘着磨损控制，磨损由模式Ⅰ向模式Ⅱ转化，呈现出高温自润滑特性。SiC-WC／SiC-WC显示了较低的摩擦系数，直到1 200℃均不高于0.35，在1 000℃、0.4 MPa压力下自对偶的比磨损率仅为SiC／SiC的比磨损率的50％左右。在600℃SiC／SiC摩擦氧化明显，氧化物主要为无定形的SiO_2，在摩擦表面形成一层由微米或亚微米级无定形平滑薄膜层，这就是样品出现自润滑的机理。
The self-dual high temperature friction properties of SiC and SiC-WC in vacuum were investigated. With the increase of temperature, the friction coefficient of SiC / SiC has little change, and the specific wear rate (the ratio of self-dual volume wear to contact pressure and friction distance) is kept at 4.0 × 10 ~ (-8) from 20 ℃ to 800 ℃ ) mm ~ 3 / (N · mm) (Mode I), decreasing from 800 ℃ to 1200 ℃ (Mode Ⅱ). The self-dual high temperature wear mechanism was controlled by a slight sticking wear. Showing high temperature self-lubricating properties. SiC-WC / SiC-WC shows a low coefficient of friction up to 0.35 at 1 200 ℃. The specific wear rate of self-dual at 1 000 ℃ and 0.4 MPa is only the specific wear rate of SiC / SiC About 50%. At 600 ℃ SiC / SiC tribological oxidation is obvious, the oxide is mainly amorphous SiO_2, the friction surface formed by the micron or sub-micron amorphous smooth film layer, which is the sample self-lubricating mechanism.