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研究了脉冲电场对Fe-C-i(Si,Mn)系合金与CaO-Al2O3-MgO系熔渣间反应的影响。在渣-金熔体间施加2 V脉冲电场,分别作用30,60 s后,渣中硅与锰质量分数随作用时间延长而逐渐增加,分别由0.31%和0.02%增加到0.63%和0.049%;金属基体的上表面和下表面硅质量分数之差与锰质量分数之差逐步减小,分别由0.06%和0.32%降至0.01%和0.022%;金属基体中硅和锰的夹杂物尺寸有不同程度的降低,其中硅的夹杂物尺寸减小最明显,由45μm左右降至5μm左右。
The effect of pulsed electric field on the reaction between Fe-C-i (Si, Mn) based alloys and CaO-Al2O3-MgO slag was investigated. After applying 2 V pulse electric field between slag and gold melt for 30 and 60 s respectively, the mass fraction of silicon and manganese in slag gradually increased with time increasing from 0.31% and 0.02% to 0.63% and 0.049% ; The difference between the mass fraction of silicon on the upper and lower surfaces of the metal substrate and the mass fraction of manganese decreased gradually from 0.06% and 0.32% to 0.01% and 0.022%, respectively; the inclusion size of silicon and manganese in the metal substrate was Different degrees of reduction, including silicon inclusions to reduce the size of the most obvious, from about 45μm down to about 5μm.