用ＥＣＲＣＶＤ（电子回旋共振化学气相沉积）方法沉积出了多晶金刚石薄膜，测量了薄膜的Ｒａｍａｎ散射谱、Ｘ射线衍射谱和ＳＥＭ。生长条件是：Ｖ（ＣＨ４）／Ｖ（Ｈ２）＝４％，气体总流量是１５０ｓｃｍ，反应压力是０．１Ｐａ，微波功率是７００Ｗ，衬底偏压是－１５０Ｖ。发现了在金刚石薄膜沉积初期阶段的分形生长现象，用ＤＬＡ模型解释了其分形生长机制，用ＭｏｎｔｅＣａｒｌｏ方法对其生长过程进行了计算机模拟，理论与实验结果相符。 Polycrystalline diamond films were deposited by ECRCVD (Electron Cyclotron Resonance Chemical Vapor Deposition), and the Raman scattering, X-ray diffraction and SEM of the films were measured. The growth conditions were: V (CH4) / V (H2) = 4%, total gas flowrate of 150 scm, reaction pressure of 0.1 Pa, microwave power 700 W and substrate bias -150V. The fractal growth phenomenon was found during the initial stage of diamond film deposition, the fractal growth mechanism was explained by DLA model, and the growth process was simulated by Monte Carlo method. The theoretical and experimental results are in good agreement.