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掩模车间的大部分工作都集中在缺陷的探测、分类和修补上。所以,在修补和探测用设备上所花的成本同加工用设备的成本差不多是毫不奇怪的。这样花费是合理的,因为每个光掩模缺陷都会直接转移到硅片上,从而产生不合格的或不能用的器件。 镀铬石英(或玻璃)掩模上的缺陷可分为不透明型和透明型两类(图1)。引起光掩模缺陷的原因已为人所知。光掩模缺陷的起因可归咎于原料(铬成份变化,抗蚀剂层中的针孔
Much of the work in the mask shop has focused on the detection, classification and repair of defects. Therefore, it is not surprising that the cost of repairing and detecting equipment is almost the same as the cost of processing equipment. This cost is reasonable, because every photomask defect will be transferred directly to the silicon, resulting in unacceptable or unusable devices. Chromium-plated quartz (or glass) mask defects can be divided into two types of opaque and transparent (Figure 1). The cause of photomask defects is known. Photomask defects can be attributed to the raw material (chromium composition changes, the pinhole in the resist layer