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脉冲电沉积制备了Ni,Ni-P,Ni-W-P合金薄膜和Ni-W-P/CeO2-SiO2纳米复合薄膜,研究了薄膜材料的高温氧化动力学特征。结果表明:在100~800℃范围内氧化1h时,纳米复合薄膜氧化增重率与氧化温度的氧化动力学曲线近似符合抛物线的递增规律;在300℃下氧化1~5h时,氧化增重率与氧化时间的氧化动力学曲线近似符合直线的递增规律;氧化温度低于400℃时,纳米复合薄膜的基质金属晶粒长大不明显;氧化温度提高到800℃时,纳米复合薄膜表面的氧化膜连续致密,没有裂纹、剥离和脱落,而Ni-W-P合金薄膜表面的氧化膜已变得疏松,甚至产生了微裂纹和针孔;CeO2和SiO2纳米颗粒在Ni-W-P基质金属中的嵌入,在提高纳米复合薄膜组织结构致密性的同时,也明显提高了抗高温氧化性能。
The Ni, Ni-P, Ni-W-P alloy films and Ni-W-P / CeO2-SiO2 nanocomposite films were prepared by pulsed electrodeposition. The oxidation kinetics of the films were investigated. The results showed that the oxidation kinetics curve of oxidation weight gain and oxidation temperature of nanocomposite films approximated the increasing parabolic law at 100 ℃ to 800 ℃ for 1 h. When oxidized for 1 to 5 h at 300 ℃, And the oxidation kinetic curve of the oxidation time approximates to the linear increasing law. When the oxidation temperature is below 400 ℃, the grain growth of the matrix metal is not obvious. When the oxidation temperature is raised to 800 ℃, the oxidation of the surface of the nanocomposite film The films were dense and continuous with no cracks, peeling and falling off. However, the oxide film on the surface of Ni-WP alloy became loose and even microcracks and pinholes were formed. The intercalation of CeO2 and SiO2 nanoparticles into Ni- In improving the structure of nanocomposite thin film structure, but also significantly improve the high temperature oxidation resistance.