论文部分内容阅读
利用光刻仿真软件PROLITH,进行了掩模版空间成像的焦深(DOF)和光学临近效应的 仿真。理论上分析了照明光瞳相干因子定义法:10％能量法和10％-90％积分能量法,并发展了因 子矫正法。仿真中分别代入了这三种定义法得到的照明光瞳相干因子,通过比较这三种情况与代 入真实光瞳的仿真结果,发现利用因子矫正法定义真实照明光瞳的相干因子,比其它两种定义法 得到的仿真结果与真实结果最接近,从而提高了仿真的准确性。
The lithography depth (DOF) and optical proximity effects of reticle space imaging were simulated by photolithography software PROLITH. Theoretical analysis of the illumination pupil coherence factor definition: 10% energy method and 10% -90% integral energy method, and the development of factor correction method. In the simulation, the illumination pupil coherence factors obtained by these three definitions are respectively substituted. By comparing these three cases with the simulation results of substituting true pupil, we find that the correlative factor of the true illumination pupil is defined by the factor correction method, The simulation result obtained by the definition method is closest to the real result, which improves the simulation accuracy.