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分析了理想无波像差条件下和有随机波像差条件下光束漂移误差与长曝光光斑光束质量β因子的关系,得出光束漂移误差与长曝光光斑的光束质量β因子的关系。理论分析和数值仿真结果显示,光束漂移误差对长曝光光斑的光束质量β因子的影响与无光束漂移误差时系统初始光束质量无关,而与光束质量β因子的评价标准和光学系统中心遮拦比有关。分析了实际应用场景下对光束漂移误差的要求,指出对长曝光光斑光束质量的要求越高,允许的光束漂移误差越小。
The relationship between the beam drift error and the β factor of long exposure beam quality under ideal waveless aberration and random wave aberration conditions is analyzed. The relationship between the beam drift error and the beam quality β factor of the long exposure spot is obtained. The theoretical analysis and numerical simulation results show that the influence of beam drift error on the beam quality β factor of the long exposure spot has nothing to do with the initial beam quality of the system without beam drift error and is not related to the evaluation standard of the beam quality β factor and the optical obstruction ratio . The requirement of beam drift error in practical application is analyzed. It is pointed out that the higher the beam quality requirement of long exposure spot, the smaller the allowable beam drift error.