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本文介绍了日本卡农公司PLA—520FA型远紫外光刻机用各种抗蚀剂对远紫外的曝光特性和以一微米图形的LSI应用为目标所试验的结果。
This article describes the Japanese company Canon Co., Ltd. PLA-520FA far-UV lithography machine with a variety of resists for the far-UV exposure characteristics and the application of LSI to a micron graphics as the goal of the test results.