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利用X射线光电子谱仪 (XPS)分析和Ar+ 刻蚀相结合的方法 ,分析了Ti膜表面的化学元素及相应原子的电子结合能。分析结果表明 :Ti膜及膜材料样品表面有大量的C、O元素 ;膜表面存在从衬底扩散至Ti膜的Mo元素。对样品刻蚀后Ti 2 p的XPS谱进行拟合表明 :Ti膜表面的Ti由TiO2 (约10 0 % )和单质Ti组成 ,随刻蚀时间的增加 ,部分TiO2 还原至低价Ti;薄的薄膜表面中的Mo由单质Mo和MoO3 组成 ,而厚的薄膜以单质Mo为主 ;表面C由石墨态和结合能为 2 88 2～ 2 88 9eV的碳化物组成。
The chemical elements on the surface of Ti film and the electron binding energies of the corresponding atoms were analyzed by X-ray photoelectron spectroscopy (XPS) and Ar + etching. The results show that a large amount of C and O elements are present on the Ti film and the sample surface, and Mo element diffuses from the substrate to the Ti film on the film surface. The XPS spectra of Ti 2 p after etching show that the Ti on the surface of Ti film is composed of TiO 2 (about 100%) and elemental Ti. With the increase of etching time, part of TiO 2 is reduced to low-valent Ti. Of the film surface Mo consists of elemental Mo and MoO3, while the thick film is dominated by elemental Mo; surface C is composed of carbides with a graphite state and a binding energy of 2 882 to 2 889 eV.