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采用多弧离子镀技术,以N2为氮源,C2H2为碳源,Ti为靶源,在单晶硅和硬质合金衬底上沉积Ti CN硬质涂层,系统地研究制备工艺对Ti CN涂层的结构、形貌、硬度及摩擦学性能的影响.用X射线衍射、原子力显微镜和扫描电子显微镜测量了涂层的形貌和晶体结构;用HX-1000显微硬度计和HH-3000划痕仪测量了涂层的硬度和结合强度.研究结果表明:Ti CN和Ti N涂层同为单相的Na Cl型面心立方结构;在优化条件下制备的Ti CN涂层的最高硬度为38.5 GPa,远高于Ti N涂层的27.9 GPa硬度;Ti CN涂层与硬质合金的膜基结合力超过70 N.
Multi-arc ion plating technique was used to deposit TiCN hard coatings on single crystal silicon and hard alloy substrates with N2 as the nitrogen source, C2H2 as the carbon source and Ti as the target. The structure, morphology, hardness and tribological properties of the coating were investigated.The morphology and crystal structure of the coating were measured by X-ray diffraction, atomic force microscopy and scanning electron microscopy.The microstructure of the coating was characterized by HX-1000 microhardness tester and HH-3000 The hardness and bonding strength of the coatings were measured by a scratch tester.The results show that the TiCN and TiN coatings are single-phase NaCl face-centered cubic structures. The maximum hardness of TiCN coatings prepared under the optimal conditions 38.5 GPa, much higher than the 27.9 GPa hardness of the Ti N coating; the bonding strength of the Ti CN coating to the cemented carbide film exceeds 70 N.