光刻技术是制造半导体器件的重要工艺之一,自六十年代初,在半导体工业得到运用以来,大大促进了半导体器件和集成电路的发展,至今仍占有重要地位.随着半导体器件向更高频率和大规模集成的方向发展,要求器件的尺寸越来越小,光刻图形的精度越来越 Lithography technology is one of the important processes for manufacturing semiconductor devices, and since the early 1960s, the semiconductor industry has greatly promoted the development of semiconductor devices and integrated circuits since the early 1960’s and still occupies an important position as semiconductor devices move toward higher Frequency and large-scale integration of the direction of development, require smaller and smaller devices, the accuracy of lithography more and more