TiAlSiN hard coatings were synthesized on high-speed steel using an arc ion enhanced magnetic sputtering hybrid system.The microstructure and hardness of the coatings at different annealing temperatures were explored by means of XRD,TEM,EDAX and Vickers indentation.The as-deposited TiAlSiN coatings were confirmed to be amorphous due to high depositing rate and low deposition temperature during the film growth.The transformation from amorphous to nanocomposites of nano-crystallites and amorphousness were observed after the annealing treatment,the microstructure of TiAlSiN coatings annealed at 800°C and 1000°C were consisted of crystalline hcp-AlN,fcc-TiN and amorphous phase,however,the coatings were only consisted of fcc-TiN and amorphous phase when annealing at 1100°C and 1200°C.Meanwhile,the formation of Al2O3 was detected on the coating surface after annealing at 1200°C and it indicated the excellent oxidation resistance of the TiAlSiN coatings under the present experimental conditions.Furthermore,the average grain size of the TiAlSiN coatings after high temperature annealing even at 1200°C was less than 30 nm and the size increased with the increasing temperature.However,the hardness of the so-deposited coatings with HV0.2N=3300 dramatically decreased with the increase of temperature and reached nearly to the hardness of TiN coatings with HV0.2N=2300. TiAlSiN hard coatings were synthesized on high-speed steel using an arc ion enhanced magnetic sputtering hybrid system. Microstructure and hardness of the coatings at different annealing temperatures were explored by means of XRD, TEM, EDAX and Vickers indentation. As-deposited TiAlSiN coatings were confirmed to be amorphous due to high film deposition rate and low deposition temperature during the film growth. The transformation from amorphous to nanocomposites of nano-crystallites and amorphousness were observed after the annealing treatment, the microstructure of TiAlSiN coatings annealed at 800 ° C and 1000 ° C was consisted of crystalline hcp-AlN, fcc-TiN and amorphous phase, however, the coatings were only consisted of fcc-TiN and amorphous phase when annealing at 1100 ° C and 1200 ° C. Meanwhile, the formation of Al2O3 was detected on the coating surface after annealing at 1200 ° C and it indicated the excellent oxidation resistance of the TiAlSiN coatings under the present experimental con ditions.Furthermore, the average grain size of the TiAlSiN coatings after high temperature annealing even at 1200 ° C was less than 30 nm and the size increased with the increasing temperature. However, the hardness of the so-deposited coatings with HV0.2N = 3300 dramatic decreased with the increase of temperature and reached nearly to the hardness of TiN coatings with HV 0.2 N = 2300.