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采用自组装技术在黄铜表面分别制备γ-巯基丙基三甲氧基硅烷(PropS-SH)、十二烷基三甲氧基硅烷(DTMS)、氨基丙基三甲氧基硅烷(APS)和γ-氯丙基三甲氧基硅烷(CPTMS)自组装膜,并分别采用电化学极化法、接触角测试和傅里叶红外光谱研究硅烷膜的耐蚀性、疏水性和结构。结果表明:经PropS-SH、DTMS和CPTMS硅烷化处理后,黄铜的耐蚀性均有提高。PropS-SH在黄铜表面形成化学吸附,同时Si─O─Si以交联形式形成硅烷膜,阻碍了溶解氧向电极表面扩散,故耐蚀性最优,黄铜经PropS-SH硅烷化后,在质量分数为3.5%的NaCl溶液中的腐蚀电流密度为0.2μA/cm2,缓蚀效率达到97.4%。
Γ-mercaptopropyltrimethoxysilane (PropS-SH), dodecyltrimethoxysilane (DTMS), aminopropyltrimethoxysilane (APS) andγ- Chloropropyl trimethoxysilane (CPTMS) self-assembled films. The corrosion resistance, hydrophobicity and structure of silane films were investigated by electrochemical polarization, contact angle measurement and Fourier transform infrared spectroscopy, respectively. The results show that the corrosion resistance of brass increases after silylation with PropS-SH, DTMS and CPTMS. PropS-SH formed on the brass surface chemical adsorption, while Si ─ O ─Si cross-linked form silane film, hinder the diffusion of dissolved oxygen to the electrode surface, it is the best corrosion resistance, brass after PropS-SH silylation , The corrosion current density is 0.2μA / cm2 in NaCl solution with mass fraction of 3.5%, and the corrosion inhibition efficiency reaches 97.4%.