论文部分内容阅读
,Thermal stability of HfO2/Si (001) films prepared by electron beam evaporation in ultrahigh vacuum
【机 构】
:
School of Materials Science & Engineering, Shanghai University, Shanghai 200072, China“,”Department
【出 处】
:
中国物理B(英文版)
【发表日期】
:
2010年12期
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