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采用直流磁控溅射技术,以掺Al为2%的Zn O陶瓷靶为靶材,通用的304不锈钢为衬底,制备了一系列Zn O∶Al薄膜,研究了溅射功率对样品薄膜结构和表面形貌、光学特性的影响。结果表明:制备的薄膜都为六方纤锌矿结构,并有高度的c轴择优取向;溅射功率对薄膜的性能有显著的影响,即随着溅射功率的增大,从35 W到80 W,晶粒尺寸先增大后减小,薄膜表面陷光结构先变好后变坏,最优值出现在溅射功率为65 W时,此时薄膜对波长小于360 nm的光吸收率约为91%。
A series of Zn O: Al thin films were prepared by direct current magnetron sputtering with Zn O ceramic target doped with 2% Al as target and common 304 stainless steel as substrate. The effect of sputtering power on the structure of sample thin film And surface morphology, optical properties. The results show that the prepared films are hexagonal wurtzite with a high degree of c-axis preferred orientation. The sputtering power has a significant effect on the properties of the films. From the sputtering power of 35W to 80 W, the grain size firstly increases and then decreases, and the trapping structure on the surface of the film becomes worse first and then the optimum value appears at a sputtering power of 65 W, at which time the light absorption of the film at a wavelength of less than 360 nm is about 91%.