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已研制成一种工作在248.4nm的远紫外分步重复系统,它是利用KnFK准分子激光器和常规设计的石英玻璃聚光镜与投影光路,对一种工业投产的系统进行翻新改造而成的。其5X投影镜头的最小视场尺寸为14.5mm,数值孔径为0.20到0.38可变。例行使用中,该机可在全视场上获得0.5μm的特征分辨率,而在较为受限的条件下,则可达到0.35μm的分辨率。本文介绍此系统及其最新改进措施,并就短波长激光光刻所涉及的某些技术问题捉出讨论。
A far-UV step-and-repeat system that has been developed at 248.4 nm has been developed to retrofit an industrial-ready system using KnFK excimer lasers and conventionally designed quartz glass condenser and projection optics. Its 5X projection lens has a minimum field of view of 14.5mm and a numerical aperture of 0.20 to 0.38. In routine use, the machine can achieve the characteristic resolution of 0.5μm in the whole field of view, and can achieve the resolution of 0.35μm under more limited conditions. This article describes the system and its latest improvements and discusses some of the technical issues involved with short wavelength laser lithography.