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Lu_2SiO_5:Ce~(3+)薄膜具有高光产额、快衰减时间、高密度、高空间分辨率等优点,有望成为X射线探测中的闪烁材料,但制备高质量的薄膜面临挑战。本工作采用溶胶凝–胶法,通过对制备过程中水硅比、烧结程序、胶黏剂和固含量等四个因素的系统研究与分析,结果表明:在空气湿度为85%,溶胶水硅比为6.6条件下,适量添加PEG400,采用优化后最佳固含量,从450℃开始进行烧结程序后退火,可制备出具有透明、平整、无裂痕的高质量Lu_2SiO_5:Ce~(3+)闪烁薄膜,单次旋涂获得的膜厚达到167 nm。实验表明水含量是引起薄膜发白的主要因素;烧结程序决定了薄膜的有机物分解程度及结晶状况;溶胶固含量及胶黏剂含量是调控薄膜厚度的重要方法。本工作为Lu_2SiO_5:Ce~(3+)闪烁薄膜的实际应用奠定了基础。
Lu 2 SiO 5: Ce 3+ films are promising scintillation materials for X-ray detection because of their high light yield, fast decay time, high density and high spatial resolution. However, the preparation of high quality thin films is challenging. In this work, the sol-gel method was used to systematically study and analyze the four factors of water-silicon ratio, sintering process, adhesive and solid content in the preparation process. The results show that when the air humidity is 85% Ratio of 6.6, PEG400 was added in proper amount, and the optimal solid content was optimized and annealed at 450 ℃ for high quality Lu2SiO5: Ce3 + flashes with a clear, flat and crack-free form Film, single spin-coating obtained film thickness of 167 nm. Experiments show that the water content is the main factor causing film whitening; sintering process determines the degree of decomposition of organic matter and the crystallization of the film; sol content and adhesive content is an important method of regulating the thickness of the film. This work laid the foundation for the practical application of the scintillation film of Lu_2SiO_5: Ce ~ (3+).