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5. Field Emission Properties of Nitrogen-doped Amorphous Carbon Films

Field Emission Properties of Nitrogen-doped Amorphous Carbon Films

来源 :半导体光子学与技术：英文版 | 被引量 : 0次 | 上传用户：jumglezhang

【摘 要】

：

Nitrogen-doped amorphous carbon thin films are deposited on the ceramic substrates coated with Ti film by using direct current magnetron sputtering technique at

【作 者】

：

LI Hui-jun ZHANG Bing-lin YAO 

【机 构】

：

Dept.ofPhys.

【出 处】

：

半导体光子学与技术：英文版

【发表日期】

：

2002年4期

【关键词】

：

Field EMISSION AMORPHOUS carbon MAGNETRON SPUTTERING Field emission  Amorphous c 

【基金项目】

：

国家高技术研究发展计划(863计划)

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Nitrogen-doped amorphous carbon thin films are deposited on the ceramic substrates coated with Ti film by using direct current magnetron sputtering technique at N2 and Ar gas mixture atmosphere during deposition. The field emission properties of the depos

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