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电感耦合高频等离子体光谱法是光谱分析的一种新技术,它具有灵敏度高、稳定性好、化学干扰少、操作方便,可同时进行多元素分析等优点.我们利用GP3.5-D1型高频等离子发生器及Q-24型摄谱仪组装成功了高频等离子光谱仪,并将它应用于半导体工艺中各种高纯材料的分析,取得了良好的效果.本文在简要叙述高频等离子体光谱法的基本原理和特点后,着重介绍仪器的组装调试方法、工作条件的选择以及达到的性能指标.将这个方法应用于水、金、四氯化硅、砷化镓、氧化硼等半导体工艺中常用的高纯材料中微量杂质的测定,灵敏度可达ppb数量级,相对标准偏差在5%以内.与一般的化学光谱法相比,取样量减少,样品处理步骤简化,操作时间缩短,空白值降低,灵敏度和准确度提高.这些实验结果表明,高频等离子体光谱法在高纯材料的分析领域中有着广阔的前景.
Inductively coupled high-frequency plasma spectrometry is a new technique of spectral analysis, which has the advantages of high sensitivity, good stability, less chemical interference, easy operation, simultaneous multi-element analysis, etc. We use GP3.5-D1 High-frequency plasma generator and Q-24 spectrograph have been successfully assembled and used in the analysis of various high-purity materials in semiconductor technology, and achieved good results.In this paper, a brief description of high-frequency plasma After the basic principle and characteristics of body spectroscopy, the method of assembly and debugging, the selection of working conditions and the performance index are introduced emphatically.The method is applied to semiconductors such as water, gold, silicon tetrachloride, gallium arsenide and boron oxide Determination of trace impurities in high-purity materials commonly used in the process, the sensitivity of up to ppb orders of magnitude, the relative standard deviation of less than 5%. Compared with the general chemical spectroscopy, sample reduction, sample processing steps to simplify, shorten the operation time, blank value Decrease, sensitivity and accuracy.These experimental results show that high-frequency plasma spectrometry has broad prospects in the field of high purity materials analysis.