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采用激光刻蚀实现了BaTiO_3薄膜上溅射Ag金属薄膜电极的图案化,并对激光刻蚀功率、激光刻蚀线间距以及点间距对图案微槽深度、刻蚀边缘整齐度和对底层BaTiO_3的影响进行了研究。结果表明,图案刻蚀边缘整齐度随刻蚀功率先增大后减小,激光刻蚀功率为12 W时达到最优值,薄膜电极图案随刻蚀线间距以及点间距减小而刻蚀更加充分,在刻蚀线间距以及点间距达到0.03mm时可以获得具有理想刻蚀精度的图案,且对BaTiO_3薄膜未造成损伤,为MLCC等薄膜电容器的低成本快速制备提供了一种新的思路。
The patterning of sputtered Ag metal thin film electrode on BaTiO_3 thin film was achieved by laser etching. The effects of laser etching power, laser line spacing and pitch on the micro-groove depth, etched edge uniformity, The impact was studied. The results show that the edge uniformity of the pattern etching increases first and then decreases with the increase of the etching power. The laser etching power reaches the optimal value at 12 W, and the pattern of the film electrode decreases with the etching line spacing and the space between the dots and the etching more Fully, the pattern with ideal etching precision can be obtained when the pitch of the etching lines and the pitch of the etching spots reach 0.03mm, and no damage is caused to the BaTiO_3 thin film, which provides a new idea for the low cost rapid preparation of the thin film capacitors such as MLCC.