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人们在预测未来微细光刻技术时,自然会有许多争论的余地吧!预测未来技术及其所用设备,并以这种预测为依据制定工作计划是不大可靠的。在这里如果对现状加以分析,我们就会知道,其中绝大部分已处于研究之中,本文选出一些难理解的问题分两个阶段(即最近三年和未来五年)加以论述。现状:三种光刻技术实际用于生产中的光刻技术如表一,表中给出了设计规则,实际使用指标和各种光刻方式的技术极限。
There is naturally plenty of room for debate when predicting the future of fine lithography! Predicting future technologies and the equipment they use, and making a plan of work based on such projections, is not very reliable. If we analyze the current situation here, we will know that most of them are under study. Some difficult questions to understand in this article are discussed in two phases (ie the last three years and the next five years). Status quo: The three lithography technology actually used in the production of lithography as shown in Table 1, the table gives the design rules, the actual use of indicators and a variety of lithography technology limits.