国际电气公司研制了一种氧化薄膜连续化学气相沉积设备DJ-7600。它利用一箱式装置依次连续从箱中取出片子制造氧化薄膜以代替常用的不连续装置,可集中处理许多硅片。生产出优质平整的薄膜成品并可节省相当多的能量。 该设备如图(略)所示,通过传送架逐个由供料箱(容量:25片)内取出片子并置于旋转加热台上。于是就制得了氧化硅薄膜。然后再通过另一传送架把氧化硅薄片放入加工过的片子箱中。整个工艺过程实现了全自动连续生产。该箱子是特制的,甚至在空气中也能制出氧化薄膜。唯一需要人工的是安放 International Electrotechnical has developed a thin film continuous chemical vapor deposition equipment DJ-7600. It utilizes a box-like device to successively remove a large number of wafers from the box to create an oxide film instead of the usual discontinuous devices. Produce high quality, flat film products and save considerable energy. The device shown in the figure (omitted), through the transport rack one by one from the feed tank (capacity: 25) and remove the film placed on the rotary table. Thus, a silicon oxide film was obtained. The silica flake is then placed in the processed film box via another transfer stand. The entire process to achieve a fully automated continuous production. The box is specially made to produce an oxidized film even in air. The only thing that needs to be done manually is placement