我们对隔离、基区制备两道工序,以相同条件进行低温预扩散,通过调整再分布的条件,获得隔离的深结和基区的浅结.此工艺减少和简化了工序,操作方便很受欢迎.长期以来,我厂的隔离扩散,都是用套筒舟在高温1070℃下进行浓硼扩散,操作很不方便.当我们改用固体BN片源,在930℃的温度下进行隔离和基区预扩散,不但获得 We isolate and base the preparation of two processes, the same conditions for low-temperature pre-diffusion, by adjusting the redistribution of conditions, access to isolated deep and base of the shallow junction. This process reduces and simplifies the process, easy to operate Welcome. For a long time, I plant isolation and diffusion, are using sleeve boat at high temperature 1070 ℃ concentrated boron diffusion, the operation is very inconvenient .When we switch to solid BN slice source, at 930 ℃ temperature isolation and Pre-proliferation base area, not only obtained