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用KrF准分子激光器作光源的64M bit-DRAM的光刻生产线已正式引进到半导体工厂。准分子激光器的生产也逐渐走向正规。并且,ArF准分子激光器光刻的研究开发是以1G bit DRAM为主,不仅要提高准分子激光器的性能.还要达到高可靠性、易维修、操作简单。本文将介绍准分子激光器在高性能、高可靠性方面的研究课题及现状。其次介绍生产用KrF准分子激光器以及研究用ArF准分子激光器的最新开发动向及其外围课题。
The 64M bit-DRAM lithography production line using a KrF excimer laser as the light source has been officially introduced into the semiconductor plant. Excimer laser production also gradually toward the formal. Moreover, research and development of ArF excimer laser lithography is mainly based on 1Gbit DRAM, which not only improves the performance of excimer laser, but also achieves high reliability, easy maintenance and simple operation. This article will introduce the research topics and current status of excimer lasers in high performance and high reliability. Second, we introduce the latest developments of KrF excimer lasers and research ArF excimer lasers and their peripheral issues.