提供了具有改进的流动性能的新的抗反射或填充组合物。所述组合物包括苯乙烯-烯丙醇聚合物和优选的至少一种其它聚合物(例如纤维素聚合物)以及苯乙烯-烯丙醇聚合物。本发明的组合物可用于保护接触孔或通孔,从退化的双镶嵌工艺的蚀刻过程中。本发明的组合物也可应用于衬底(例如,硅晶片),以形成具有高蚀刻率的抗反射涂层,其在 A new anti-reflective or filling composition with improved flow properties is provided. The composition includes a styrene-allyl alcohol polymer and preferably at least one other polymer (eg, a cellulosic polymer) and a styrene-allyl alcohol polymer. The composition of the present invention can be used to protect contact holes or vias from being etched during a degraded dual damascene process. The composition of the present invention can also be applied to a substrate (for example, a silicon wafer) to form an antireflection coating having a high etching rate,