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应用氩激光的一种透明缺陷修补系统(DRS)预示着可以大大节省修补铬膜孔隙的时间。Quan-tronix公司的这种新型DRSII系统较之目前卸下法修补半导体制造中的划线片和光掩模能节省很多时间。此系统较与之竞争的离子束系统也具有优点。随着光掩模上光学分挡器日益普及,缺陷修补的重要性也日益增大。光掩模含有每一晶片印模的
A transparent defect repair system (DRS) using argon laser indicates a significant saving of time in repairing the pores of the chromium film. Quan-tronix’s new DRSII system can save a lot of time compared to current scribing and reworking of reticle and photomasks in semiconductor manufacturing. This system also has advantages over competing ion beam systems. With the increasing popularity of optical dividers on photomasks, the importance of defect repair is also increasing. The photomask contains each wafer stamp